TEMC is a professional materials company that manufactures specialty gas for semiconductors and displays.
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Rare Gas
Ne/He Separation &
Cryo-Purification
Rare Gas - Ne/He Separation & Cryo - Purification
- Item
- - Ne and He
- Product
- - 6N(99.9999%) Neon
- Capacity
- - 84,000 NM3/Year
- Customer Application
- - Excimer Laser Gas Mixing
- Process Description
- - High performance PSA and Cryo-purification
- - In-Line Analysis System
- - High Safety Controlled by a Auto System
- Cylinder Capability
- - 47 L, ISO Tube
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Rare Gas
Excimer Mixing
System
Rare Gas - Excimer Mixing System
- Item
- - Excimer Laser Gases
- Product
- - ArF / ArF2 / KrF / KrF2
- - ELA(LTPS) , Medical Excimer Laser
- Capacity
- - 12,000 Cyls/Year
- Customer Application
- - Photo Lithography process, ELA(LTPS)
- Process Description
- - High Precision weight measuring system
- - High Safety Controlled by a Full Auto System
- Cylinder Capability
- - 2 L ~ 47 L
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Rare Gas
Xe/Kr Separation &
Cryogenic Distillation
Rare Gas - Xe/Kr Separation & Cryogenic Distillation
- Item
- - Xe and Kr
- Product
- - 5N Kr 8,000L in 47L cylinder
- - 4N8 Xe 150L in 2L or 10,000L in 47L cylinder
- Capacity
- - 26,400 NM3/Year
- - Kr – 24,000 NM3/Year
- - Xe – 2,400 NM3/Year
- Customer Application
- - Implantation and Etching process
- Process Description
- - Adsorption, Cryogenic distillation and Purifier
- - Trans-Filling system
- - In-Line Analysis system
- - High Safety Controlled by a Auto system
- Cylinder Capability
- - 2 L ~ 47 L
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CO
Adsorption and Hp
Purification System
CO - Adsorption and HP Purification System
- Item
- - CO (Carbon Monoxide)
- Product
- - 4N5 (99.995%)
- Capacity
- - 67,000 NM3/Year
- Customer Application
- - Implantation & Deep Etching
- Process Description
- - Adsorption and Separation system
- - In–Line Analysis System
- - High Safety Controlled by a Auto System
- Cylinder Capability
- - 47 L & 2.2L
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COS
Distillation System
COS - Distillation System
- Item
- - COS (Carbonyl Sulfide)
- Product
- - 3N (99.9%)
- Capacity
- - 20 MT/Year
- Customer Application
- - Dry Etching
- Process Description
- - Low temperature Multi-Distillation System
- - High Selective Adsorption system
- - High Safety Controlled by a Auto System
- Cylinder Capability
- - 47 L
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11BF3
Mixture
11BF3 - Mixture
- Item
- - 11BF3 Pure & 11BF3 Mixture
- Product
- - 11BF3 Pure
- - 11BF3 / H2 Mixture (Per customer requests)
- Capacity
- - 6,000 cyls /Year
- Customer Application
- - Ion Implantation
- Process Description
- - Full automated PLC control system
- - SCV Valve Performance test by auto program
- Cylinder Capability
- - 2.2 L and 6.9 L
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C4F6
Simple Purification
and Trans-Filling
C4F6 - Simple Purification and Trans Filling
- Item
- - C4F6 (1,3-Butadiene)
- Product
- - 3N5 (99.95%)
- Capacity
- - 200 MT/Year
- Customer Application
- - Dry Etching
- Process Description
- - Simple purification and weight filling system
- - In–Line Analysis System
- - High Safety Controlled by a Auto System
- Cylinder Capability
- - 47 L
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CHF3
Distillation System
CHF3 - Distillation System
- Item
- - CHF3 (TrifluoroMethane, R23)
- Product
- - 5N (99.999%)
- Capacity
- - 150 MT/Year
- Customer Application
- - Dry Etching
- Process Description
- - In–Line Analysis System
- - High Safety Controlled by a Auto System
- Cylinder Capability
- - 47 L
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C3F8
Trans-Filling
C3F8 - Trans Filling
- Item
- - C3F8 (OctaFluoroPropane, Halocarbon 218)
- Product
- - 4N (99.99%)
- Capacity
- - 200 MT/Year
- Customer Application
- - Dry Etching
- Process Description
- - Simple purification and Trans-fill system
- - In–Line Analysis System
- - High Safety Controlled by a Auto System
- Cylinder Capability
- - 47 L
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C4F8
Trans-Filling
C4F8 - Trans Filling
- Item
- - C4F8 (CycloButane, Freon C318)
- Product
- - 5N (99.999%)
- Capacity
- - 300 MT/Year
- Customer Application
- - Dry Etching
- Process Description
- - Simple purification and Trans-fill system
- - In–Line Analysis System
- - High Safety Controlled by a Auto System
- Cylinder Capability
- - 47 L
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